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Essay / Impact of Zr Content on Multi-Phase Zirconium Tungsten Oxide become one of the pressing global research problems. Diodes, such as PN junction, Zener diode, Schottky diode, tunnel diode, crystal diode, light emitting diode…etc. have been widely studied and applied recently. Say no to plagiarism. Get a tailor-made essay on “Why Violent Video Games Should Not Be Banned”? Get the original essayAmong this Schottky diode (SD), metal-semiconductor (MS) type Schottky diode has attracted much attention due to its high efficiency of electronic devices. However, many of these contacts are not manufactured as MS contacts; they are fabricated as metal-interposer-semiconductor (MIS) contacts. These structures are fabricated by covering a semiconductor substrate with an organic/inorganic layer on which a metal electrode is deposited. In contact MS, studies in the literature have shown that the height of the barrier can be increased or decreased by using an intermediate layer on the semiconductor substrate. The new electrical properties of MS contacts can be promoted through the choice of an appropriate intermediate layer. Suitable interface layers such as MIS structure based on TiO2, WO3, MoO3, SnO2, In2O3, etc. have been used for switching devices, where the presence of the insulating layer would provide lower leakage current and reduce power consumption. MIS based SBDs have been fabricated with SiO2, Si3 N4, ZrO2 and HfO2 etc. as an insulating layer and conventional metal electrodes (Pt, Cu, Ni, Au, etc.). Low leakage current is an important aspect of photodiodes. There are also many studies on metal-insulator-semiconductor (MIS)-based SBD, especially due to its advantages such as lower leakage current and higher rectification ratio. Among these, molybdenum trioxide (MoO3) has recently attracted rapid interest due to its unique layered structure and is a promising material due to its high electrical conductivity and optical transmission in the visible region, which makes it make it suitable for optoelectronic devices. Commonly observed phases in MoO3 thin films are α-MoO3 (orthorhombic), β-MoO3 (monoclinic), and h-MoO3 (hexagonal). These three phases have different physical and chemical properties, such as good crystal size, refractive index, wide bandgap energy, absorbance, electrical conductivity, coloring, transparency and mechanical hardness. In the solid state, hydrated α-MoO3 is composed of double layers of distorted octahedral MoO6 in an orthorhombic crystal, which are held together by a weak Van der Waals force. These MoO3 have been widely used in the fields of solar cells, diodes, gas sensors, batteries, pseudocapacitors and biomedical. This α-MoO3 phase can be easily obtained in the atmosphere. Additionally, MoO3 thin films are prepared by different methods such as atomic layer deposition, spin coating, chemical vapor deposition (CVD), magnetron sputtering, chemical bath deposition (CBD), and pyrolysis. by jet nebulizer spray (JNSP). Among these techniques, JNSP technique has many advantages such as low cost, easy handling, large area deposition, uniform coating and reduced deposition time. Report on the influence of metal working function and..
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